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Proceedings Paper

EMPOF: electronic mask production order forms
Author(s): J. Gordon Hughes; David Muir; Leslie Drennan
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Paper Abstract

The interface between the customer and the mask shop is one of the most error prone stages of the mask production process. Errors introduced at this stage can often be very hard to detect at subsequent stages of the manufacturing process. To assist their customers, Compugraphics have developed an automated system, called EMPOF, to allow customers to specify their orders using the Internet. The system was designed as a replacement to the existing Mask Production Order Forms that were being used by Compugraphics, and was deliberately kept simple to encourage the use of the system by a large number of smaller customers, rather than a complementary solution based on the SEMI P10 format that is also available. The paper reviews the structure and user interfaces of the software; showing how a customer is presented with default forms that can be customized to their processes, the default forms can also be partially completed where certain aspects of the orders do not change. A comprehensive on-line help facility is also included within the software. Orders that are submitted with the EMPOF system are then automatically prepared for manufacture using the DO_EMPOF software. This strategy minimizes the need for human interaction resulting in a robust process. Future plans to extend the EMPOF system by integrating it with the SEMI P10 and 2MPOFDB applications are described.

Paper Details

Date Published: 17 December 2003
PDF: 10 pages
Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); doi: 10.1117/12.517507
Show Author Affiliations
J. Gordon Hughes, Compugraphics International Ltd. (United Kingdom)
David Muir, Compugraphics International Ltd. (United Kingdom)
Leslie Drennan, Compugraphics International Ltd. (United Kingdom)

Published in SPIE Proceedings Vol. 5256:
23rd Annual BACUS Symposium on Photomask Technology
Kurt R. Kimmel; Wolfgang Staud, Editor(s)

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