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Proceedings Paper

OPC methods to improve image slope and process window
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Paper Abstract

In this paper, we use the gradient of the image slope and gradient of the edge placement error (EPE) in order to improve both slope and EPE during OPC. The EPE gradient taken with respect to edge position is normally called MEEF or more generally, the MEEF matrix. Use of the gradient of image slope with respect to change in edge position is a relatively new concept, introduced by Granik as the “contrast matrix”. Whereas traditional OPC techniques focus on EPE alone (pattern fidelity), we broaden the scope of OPC to maximize slope for improved image robustness and to maximize process window.

Paper Details

Date Published: 10 July 2003
PDF: 10 pages
Proc. SPIE 5042, Design and Process Integration for Microelectronic Manufacturing, (10 July 2003); doi: 10.1117/12.515190
Show Author Affiliations
Nicolas B. Cobb, Mentor Graphics Corp. (United States)
Yuri Granik, Mentor Graphics Corp. (United States)

Published in SPIE Proceedings Vol. 5042:
Design and Process Integration for Microelectronic Manufacturing
Alexander Starikov, Editor(s)

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