Share Email Print

Proceedings Paper

Implementation of 248-nm-based CD metrology for advanced reticle production
Author(s): Andrew C. Hourd; Anthony Grimshaw; Gerd Scheuring; Christian Gittinger; Stefan Dobereiner; Frank Hillmann; Hans-Jurgen Bruck; Hans Hartmann; Volodymyr Ordynskyy; Kai Peter; Shiuh-Bin Chen; Parkson W. Chen; Rik M. Jonckheere; Vicky Philipsen; Thomas Schatz; Karl Sommer
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

The MueTec advanced CD metrology and review station, operating at the DUV (248nm) wavelength, has been extensively characterised for a number of feature types relevant to advanced (9Onm technology node) reticles. Performance for resolution capability and measurement repeatability is presented here for chrome-on-glass feature types concentrating upon lines and spaces, contact holes and dots. The system has already demonstrated the ability to image 100nm Cr lines and sub-nanometre (3- sigma) long-term repeatability on lines and spaces down to 200nm in size. We will now show that this performance level can be achieved and sustained at production levels of throughput and under typical cleanroom environmental conditions. Performance of new software tools to support the advanced metrology of 90-nm node reticles will also be introduced and their performance evaluated. Comparison will be made between CD-SEM measurements and the advanced optical metrology offered by the tool. Finally, reliability data for the tool —both in terms of mechanical and sustained repeatability performance — will be given, following prolonged trials in a production environment.

Paper Details

Date Published: 28 May 2003
PDF: 10 pages
Proc. SPIE 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (28 May 2003); doi: 10.1117/12.515114
Show Author Affiliations
Andrew C. Hourd, Compugraphics International Ltd. (United Kingdom)
Anthony Grimshaw, Compugraphics International Ltd. (United Kingdom)
Gerd Scheuring, MueTec GmbH (Germany)
Christian Gittinger, MueTec GmbH (Germany)
Stefan Dobereiner, MueTec GmbH (Germany)
Frank Hillmann, MueTec GmbH (Germany)
Hans-Jurgen Bruck, MueTec GmbH (Germany)
Hans Hartmann, PDF Solutions GmbH (Germany)
Volodymyr Ordynskyy, PDF Solutions GmbH (Germany)
Kai Peter, PDF Solutions GmbH (Germany)
Shiuh-Bin Chen, Taiwan Mask Corp. (Taiwan)
Parkson W. Chen, Taiwan Mask Corp. (Taiwan)
Rik M. Jonckheere, IMEC vzw (Belgium)
Vicky Philipsen, IMEC vzw (Belgium)
Thomas Schatz, Infineon Technologies AG (Germany)
Karl Sommer, Karl Sommer Consulting (Germany)

Published in SPIE Proceedings Vol. 5148:
19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?