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Proceedings Paper

Fully automated CD: metrology and mask inspection in a mask production environment using the MueTec DUV tool
Author(s): Gerd Scheuring; Alexander Petrashenko; Stefan Doebereiner; Frank Hillmann; Hans-Jurgen Bruck; Andrew C. Hourd; Anthony Grimshaw; Gordon Hughes; Shiuh-Bin Chen; Parkson W. Chen; Thomas Schatz; Thomas Struck; Paul J. M. van Adrichem; Herman Boerland; Sigrid Lehnigk
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Paper Abstract

Besides the metrology performance of a CD measurement tool, its close integration into a manufacturing environment becomes more and more important. This is extremely driven by the ever increasing complexity of masks and their tightening specifications. Hence, this calls for the capability of fully automated CD measurements on a large number of dense and isolated lines and 2-dimensional features under production conditions. In this paper we report on such a highly automated measurement system for CD measurements from MueTec. Either an ASCII software interface or a specially developed software interface to connect the MueTec with the CATSTM mask data fracturing software handles the large amount of co-ordinates and other information like design images from the measurement sites and their surrounding, which are necessary for fully automated CD measurements. Because the latter is the standard in mask-making and data-formats, this level of automation guarantees a good industrial integration of the MueTec system. Fully automated and reliable CD measurements are based on very stable tool hardware and especially on a positioning stage with best possible positioning accuracy (range better 0.5 ?m), significantly improved possibilities of software controlled positioning and an automated job set up and execution. The time gain in relation to existing measurement programs in the extent of supply has turned out to be dramatically large. The User Interfaces and their applications will be described.

Paper Details

Date Published: 28 May 2003
PDF: 10 pages
Proc. SPIE 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (28 May 2003); doi: 10.1117/12.515107
Show Author Affiliations
Gerd Scheuring, MueTec GmbH (Germany)
Alexander Petrashenko, MueTec GmbH (Germany)
Stefan Doebereiner, MueTec GmbH (Germany)
Frank Hillmann, MueTec GmbH (Germany)
Hans-Jurgen Bruck, MueTec GmbH (Germany)
Andrew C. Hourd, Compugraphics International Ltd. (United Kingdom)
Anthony Grimshaw, Compugraphics International Ltd. (United Kingdom)
Gordon Hughes, Compugraphics International Ltd. (United Kingdom)
Shiuh-Bin Chen, Taiwan Mask Corp. (Taiwan)
Parkson W. Chen, Taiwan Mask Corp. (Taiwan)
Thomas Schatz, Infineon Technologies AG (Germany)
Thomas Struck, Infineon Technologies AG (Germany)
Paul J. M. van Adrichem, Numerical Technologies Inc. (United States)
Herman Boerland, Numerical Technologies Inc. (United States)
Sigrid Lehnigk, Submicron Technologies GmbH (Germany)

Published in SPIE Proceedings Vol. 5148:
19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

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