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Proceedings Paper

Novel CVD technique for deposition of oxide films for sensors
Author(s): S. Roy; S. Basu
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Paper Abstract

A modified-CVD method was developed to deposit thin films of oxides for device applications. ZnO thin films were deposited on various substrates after optimizing the growth parameters. The quality of the ZnO films was investigated using x-ray diffraction and scanning electron microscopy. The same ZnO film deposited on quartz substrate has been used for sensing hydrogen gas at 400°C.

Paper Details

Date Published: 14 October 2003
PDF: 8 pages
Proc. SPIE 5062, Smart Materials, Structures, and Systems, (14 October 2003); doi: 10.1117/12.514622
Show Author Affiliations
S. Roy, Indian Institute of Technology, Kharagpur (India)
S. Basu, Indian Institute of Technology, Kharagpur (India)

Published in SPIE Proceedings Vol. 5062:
Smart Materials, Structures, and Systems
S. Mohan; B. Dattaguru; S. Gopalakrishnan, Editor(s)

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