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Proceedings Paper

Synchrotron radiation microlithography and etching (SMILE) for MEMS fabrication
Author(s): Susumu Sugiyama
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Paper Abstract

With the established technique of LIGA process, fabrication of three dimensional structure in micron and submicron order has become feasible. High aspect ratio microstructure technology (HARMST) have been studied uisng synchrotron radiation microlithography and etching (SMILE). Plane-pattern to cross-section transfer (PCT) technique, has been applied for forming of three-dimensional microstructures with novel shapes using deep X-ray lithography. On the other hand, a new approach of three-dimensional (3-D) micromachining without using any masks is proposed. This approach is a direct writing using synchrotron radiation (SR) etching. A few results of 3-D micromachining of PTFE using SR etching in vacuum and under an atmospheric pressure of He are also demonstrated.

Paper Details

Date Published: 14 October 2003
PDF: 12 pages
Proc. SPIE 5062, Smart Materials, Structures, and Systems, (14 October 2003); doi: 10.1117/12.514373
Show Author Affiliations
Susumu Sugiyama, Ritsumeikan Univ. (Japan)

Published in SPIE Proceedings Vol. 5062:
Smart Materials, Structures, and Systems
S. Mohan; B. Dattaguru; S. Gopalakrishnan, Editor(s)

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