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Proceedings Paper

Manufacturing of four-quadrant phase mask for nulling interferometry in the thermal infrared
Author(s): Frederic Lemarquis; Michel Lequime; Gerard Albrand; Ludovic Escoubas; Jean-Jacques Simon; Jacques Baudrand; Pierre Riaud; Daniel Rouan; Anthony Boccaletti; Pierre Baudoz; Dimitri Mawet
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Paper Abstract

The Four Quadrant Phase Mask is a key component for the design of advanced coronagraphs that may be used to search exo-planets. The validity of this concept has been demonstrated in the visible and need now to be demonstrated in the mid infrared. For this purpose, two components are manufactured for wavelengths 4.75 and 16.25 μm. This manufacturing requires the deposition of ZnSe layers using Ion Assisted Deposition, followed by a lift off process.

Paper Details

Date Published: 25 February 2004
PDF: 9 pages
Proc. SPIE 5250, Advances in Optical Thin Films, (25 February 2004); doi: 10.1117/12.513386
Show Author Affiliations
Frederic Lemarquis, Institut Fresnel, CNRS-ENSPM (France)
Michel Lequime, Institut Fresnel, CNRS-ENSPM (France)
Gerard Albrand, Institut Fresnel, CNRS-ENSPM (France)
Ludovic Escoubas, Institut Fresnel, CNRS-ENSPM (France)
Jean-Jacques Simon, Institut Fresnel, CNRS-ENSPM (France)
Jacques Baudrand, Observatoire de Paris-Meudon (France)
Pierre Riaud, Observatoire de Paris-Meudon (France)
Daniel Rouan, Observatoire de Paris-Meudon (France)
Anthony Boccaletti, Observatoire de Paris-Meudon (France)
Pierre Baudoz, Observatoire de Paris-Meudon (France)
Dimitri Mawet, Univ. de Liege (Belgium)

Published in SPIE Proceedings Vol. 5250:
Advances in Optical Thin Films
Claude Amra; Norbert Kaiser; H. Angus Macleod, Editor(s)

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