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Proceedings Paper

Thermal stability of Mo/Si multilayers
Author(s): Robert S. Rosen; Michael A. Viliardos; M. E. Kassner; Daniel Gorman Stearns; Stephen P. Vernon
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Paper Abstract

The thermal stability of Mo/Si multilayers for x-ray mirror applications was investigated by annealing studies at relatively low temperatures for various times. The as-deposited and annealed multilayers were examined using conventional small and large angle x-ray diffraction, normal incidence x-ray reflectance measurements using a synchrotron source, selected area electron diffraction, and high-resolution electron microscopy. The as-deposited structure consists of pure layers of crystalline Mo and amorphous Si separated by thin regions of amorphous Mo-Si. At temperatures between 200 - 400 degree(s)C the amorphous Mo-Si interlayers grow and hexagonal MoSi2 forms by a thermally activated process(es) and the bilayer spacing and x-ray reflectivity decrease. A determination of the effective activation energy of the process(es) suggests long-term stability at the mirror operating temperature, although additional low temperature testing is warranted.

Paper Details

Date Published: 1 January 1992
PDF: 9 pages
Proc. SPIE 1547, Multilayer Optics for Advanced X-Ray Applications, (1 January 1992); doi: 10.1117/12.51281
Show Author Affiliations
Robert S. Rosen, Lawrence Livermore National Lab. (United States)
Michael A. Viliardos, Lawrence Livermore National Lab. (United States)
M. E. Kassner, Oregon State Univ. (United States)
Daniel Gorman Stearns, Lawrence Livermore National Lab. (United States)
Stephen P. Vernon, Vernon Applied Physics (United States)

Published in SPIE Proceedings Vol. 1547:
Multilayer Optics for Advanced X-Ray Applications
Natale M. Ceglio, Editor(s)

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