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Proceedings Paper

Fabrication of advanced x-ray optics with magnetron minisource arrays
Author(s): Alan F. Jankowski; R. J. Foreman; Daniel M. Makowiecki
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Paper Abstract

A process for direct application of multilayered coatings to large area (180 cm2) planar or curved optical surfaces has been developed. Small diameter (2.54 cm) sputter sources are appropriately configured in an array for the deposition of multilayered coatings on virtually any optical surface. Potential application in soft x-ray projection lithography is examined for the deposition of Mo/Si multilayers with a uniform, 6.5 - 7 nm, layer pair spacing onto 15.2 cm diameter silicon wafers. Layer pair spacing variations less than 1.5%, over surface areas exceeding 120 cm2, are measured using Cu (Kappa) (alpha) grazing incidence diffraction.

Paper Details

Date Published: 1 January 1992
PDF: 7 pages
Proc. SPIE 1547, Multilayer Optics for Advanced X-Ray Applications, (1 January 1992); doi: 10.1117/12.51266
Show Author Affiliations
Alan F. Jankowski, Lawrence Livermore National Lab. (United States)
R. J. Foreman, Lawrence Livermore National Lab. (United States)
Daniel M. Makowiecki, Lawrence Livermore National Lab. (United States)

Published in SPIE Proceedings Vol. 1547:
Multilayer Optics for Advanced X-Ray Applications
Natale M. Ceglio, Editor(s)

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