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Proceedings Paper

Optical wave engineering for nanoscale surface metrology
Author(s): Joseph Shamir; Boris Spektor; Yurij Parkhomenko
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Paper Abstract

A novel approach to optical surface metrology in the nano-scale region was introduced recently. The approach is based on scanning of the interrogated space by specially structured light distributions and the analysis of the scattered light in the far field. For high resolution metrology, various dark beams as the scanning beams were found to be most effective. After a short overview of the measuring procedure, this paper addresses appropriate optical wave front engineering methods. These include the employment of diffractive optical elements designed for wave engineering within a three-dimensional section of space as well as laser beam structuring within the laser cavity.

Paper Details

Date Published: 31 December 2003
PDF: 9 pages
Proc. SPIE 5182, Wave-Optical Systems Engineering II, (31 December 2003); doi: 10.1117/12.511601
Show Author Affiliations
Joseph Shamir, Technion-Israel Institute of Technology (Israel)
Boris Spektor, Technion-Israel Institute of Technology (Israel)
Yurij Parkhomenko, Technion-Israel Institute of Technology (Israel)

Published in SPIE Proceedings Vol. 5182:
Wave-Optical Systems Engineering II
Frank Wyrowski, Editor(s)

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