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Proceedings Paper

Recent advances in blazed grating fabrication by electron-beam lithography
Author(s): Daniel W. Wilson; Paul D. Maker; Richard E. Muller; Pantazis Z. Mouroulis; Johan Backlund
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Paper Abstract

Convex and concave diffraction gratings are required for concentric imaging spectrometer forms. Direct-write electron-beam lithography has proven to be an effective method for fabricating high-efficiency blazed gratings on non-flat substrates. Recently fabricated convex gratings have demonstrated relative efficiency greater than 90%, diffuse scatter and ghosts less than 5x10-4 of the main diffraction order, and zeroth-order wavefront error less than 1/4-wave at 633 nm. Such gratings can be fabricated on JPL’s JEOL JBX-9300FS electron-beam lithography system with a writing speed of approximately 1 to 2 cm2 per hour. The technique was recently used to fabricate flight-qualified gratings for the Compact Reconnaissance Imaging Spectrometer for Mars (CRISM) instrument that is scheduled to fly on the NASA Mars Reconnaissance Orbiter in 2005.

Paper Details

Date Published: 3 November 2003
PDF: 12 pages
Proc. SPIE 5173, Current Developments in Lens Design and Optical Engineering IV, 51730E (3 November 2003); doi: 10.1117/12.510204
Show Author Affiliations
Daniel W. Wilson, Jet Propulsion Lab. (United States)
Paul D. Maker, Jet Propulsion Lab. (United States)
Richard E. Muller, Jet Propulsion Lab. (United States)
Pantazis Z. Mouroulis, Jet Propulsion Lab. (United States)
Johan Backlund, Jet Propulsion Lab. (United States)

Published in SPIE Proceedings Vol. 5173:
Current Developments in Lens Design and Optical Engineering IV
Pantazis Z. Mouroulis; Warren J. Smith; R. Barry Johnson, Editor(s)

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