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Proceedings Paper

Scattering losses in fused silica and CaF2 for DUV applications
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Paper Abstract

Scattering losses for fused silica were measured over a wide wavelength range (193-800 nm) using different laser sources. The data indicate that scattering centers are smaller than ~ 12 nm, and scattering is consistent with Rayleigh type even at 193 nm. Scattering losses scale with wavelength as 1/λ4, and scattering loss at 193 nm was found to be (0.65±0.08)x10-3/ cm absorption units or (0.15±0.02)% transmission per cm. CaF2 measurements were completed in the visible wavelength range. The experimental approach for DUV wavelength measurements for CaF2 is described. Estimated scattering losses at 193 nm are ~0.003% transmission per cm and ~0.006% transmission per cm at 157 nm. Data for CaF2 indicate deviation from Rayleigh-type scatter.

Paper Details

Date Published: 26 June 2003
PDF: 12 pages
Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.508120
Show Author Affiliations
Stephan L. Logunov, Corning Inc. (United States)
Sergey A Kuchinsky, Corning Inc. (United States)

Published in SPIE Proceedings Vol. 5040:
Optical Microlithography XVI
Anthony Yen, Editor(s)

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