Proceedings Paper
Rigorous wavefront analysis of the visible-light point diffraction interferometer for EUVL| Format | Member Price | Non-Member Price |
|---|---|---|
| $17.00 | $21.00 |
Paper Abstract
In visible-light point diffraction interferometer (PDI), in order to achieve measurement error <0.1 - 0.2 nm rms, wavefront irregularity from the pinhole must be supressed as 0.05 - 0.1 nm rms in designing. It is so difficult to execute such high accurate (10-4λ) simulation because the numerical electromagnetic simulation shows slow convergence in the visible-region. We discussed this problem by using 2D-model and found simulation conditions to obtain significant results. By using the simulator, several kind of systematic erros have been analyzed and optimized.
Paper Details
Date Published: 13 January 2004
PDF: 9 pages
Proc. SPIE 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, (13 January 2004); doi: 10.1117/12.507046
Published in SPIE Proceedings Vol. 5193:
Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications
Ali M. Khounsary; Udo Dinger; Kazuya Ota, Editor(s)
PDF: 9 pages
Proc. SPIE 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, (13 January 2004); doi: 10.1117/12.507046
Show Author Affiliations
Katsura Otaki, Extreme Ultraviolet Lithography System Development Association (Japan)
Yucong Zhu, Extreme Ultraviolet Lithography System Development Association (Japan)
Mikihiko Ishii, Extreme Ultraviolet Lithography System Development Association (Japan)
Yucong Zhu, Extreme Ultraviolet Lithography System Development Association (Japan)
Mikihiko Ishii, Extreme Ultraviolet Lithography System Development Association (Japan)
Shigeru Nakayama, Extreme Ultraviolet Lithography System Development Association (Japan)
Katsuhiko Murakami, Extreme Ultraviolet Lithography System Development Association (Japan)
Takashi Gemma, Nikon Corp. (Japan)
Katsuhiko Murakami, Extreme Ultraviolet Lithography System Development Association (Japan)
Takashi Gemma, Nikon Corp. (Japan)
Published in SPIE Proceedings Vol. 5193:
Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications
Ali M. Khounsary; Udo Dinger; Kazuya Ota, Editor(s)
© SPIE. Terms of Use
