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Proceedings Paper

Photo-induced adhesion changes: a technique for patterning lightguide structures
Author(s): H. G. Festl; Hilmar Franke
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Paper Abstract

A two-step procedure is described where a photosensitive layer of doped PMMA is spin- coated on a glass substrate, exposed to a UV pattern, and, finally, covered in a second spin- coating procedure. The result is a thickness pattern that follows the UV image. The obtained waveguides are characterized with respect to their effective indices as a function of UV exposure and spinning speed. Simple elements like lenses or beam splitters are discussed.

Paper Details

Date Published: 1 December 1991
PDF: 14 pages
Proc. SPIE 1559, Photopolymer Device Physics, Chemistry, and Applications II, (1 December 1991); doi: 10.1117/12.50690
Show Author Affiliations
H. G. Festl, Univ. Duisburg-Gesamthochschule (Germany)
Hilmar Franke, Univ. Duisburg-Gesamthochschule (Germany)

Published in SPIE Proceedings Vol. 1559:
Photopolymer Device Physics, Chemistry, and Applications II
Roger A. Lessard, Editor(s)

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