Share Email Print

Proceedings Paper

Photolithographic imaging of computer-generated holographic optical elements
Author(s): Felix P. Shvartsman; Moshe Oren
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

A new photo-lithographic imaging (PLI) method to produce high efficiency volume phase-only CGH has been developed. PLI technique utilizes Du Pont proprietary materials and processes to replicate a binary intensity CGH, recorded on a chrome photomask-master, into a dry photopolymer. By changing the refractive index of the photopolymer in the imaged areas the intensity modulated pattern in the chrome photomask-master is converted into a volume phase modulated pattern with a single lithographic step. This technique was used to fabricate a variety of computer generated holographic optical element (CGHOE), such as on-axis and off- axis Fresnel zone plates and array illuminators. Diffraction efficiencies up to 98% were observed for a CGHOE consisting of a 10 X 10 array of off-axis Fresnel zone plates. Such CGHOEs can be fabricated on a variety of substrates and in different configurations, providing substantial technological and economical advantages over existing conventional manufacturing techniques for diffractive binary CGHOEs.

Paper Details

Date Published: 1 December 1991
PDF: 9 pages
Proc. SPIE 1555, Computer and Optically Generated Holographic Optics; 4th in a Series, (1 December 1991); doi: 10.1117/12.50650
Show Author Affiliations
Felix P. Shvartsman, E.I. du Pont de Nemours and Co., Inc. (United States)
Moshe Oren, E.I. du Pont de Nemours and Co., Inc. (United States)

Published in SPIE Proceedings Vol. 1555:
Computer and Optically Generated Holographic Optics; 4th in a Series
Ivan Cindrich; Sing H. Lee, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?