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Proceedings Paper

Resist hardening without surface deviation
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Paper Abstract

We report on a novel technique for hardening micro-optical resist elements, like beam-shaping elements or micro lenses, with large profile depths before proportional transfer into the fused silica substrate. This technique allows to harden the resist with only small distorsions of the height profile. For demonstration a refractive beam shaper was designed and fabricated in photo-resist using gray-tone lithography. This element was transfered into fused silica with high etch rates using an optimized set of parameters in an ICP-etcher.

Paper Details

Date Published: 3 November 2003
PDF: 8 pages
Proc. SPIE 5183, Lithographic and Micromachining Techniques for Optical Component Fabrication II, (3 November 2003); doi: 10.1117/12.505797
Show Author Affiliations
Holger Hartung, Friedrich-Schiller-Univ. Jena (Germany)
Matthias Cumme, Friedrich-Schiller-Univ. Jena (Germany)
Mike Thieme, Friedrich-Schiller-Univ. Jena (Germany)
Ernst-Bernhard Kley, Friedrich-Schiller-Univ. Jena (Germany)
Andreas Tuennermann, Friedrich-Schiller-Univ. Jena (Germany)

Published in SPIE Proceedings Vol. 5183:
Lithographic and Micromachining Techniques for Optical Component Fabrication II
Ernst-Bernhard Kley; Hans Peter Herzig, Editor(s)

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