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Proceedings Paper

One way to accomplish the advanced requests of nanometrology: the nanometer coordinate measuring machine (NCMM)
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Paper Abstract

To achieve large area AFM scans in millimeter range without stitching procedures a Nanometer Coordinate Measuring Machine(NCMM) is under development. We have combined a specially manufactured UltraObjective AFM head of S.I.S. GmbH with the first prototype of an ultra precise nanometer positioning system of SIOS Messtechnik GmbH in cooperation with the Technical University Ilmenau. That means having a sensor system that delivers x-, y- and z-position with interferometer accuracy of almost 1nm and z-probing with resolution of an Atomic Force Microscope. Overall we are building a measuring instrument with a working volume of at least 20mm x 20mm x 5mm without leaving nanometer accuracy. Last year we presented the first AFM measurements of the NCMM with scan lengths up to 500 microns. After all this is 5 times more than conventional SPMs can achieve, but it is only the first step on the way to advanced characterization techniques in the field of nanometrology. The calibration of our NCMM has been improved and AFM scans with millimeter ranges are performed. The progress made will be shown in this paper. It also will present observed obstacles regarding to the endeavors of developing advanced metrology techniques for the tremendously increasing field of nanometrology. For example measuring speed, amount of measuring data and suitable measurement strategies have to be discussed.

Paper Details

Date Published: 4 November 2003
PDF: 9 pages
Proc. SPIE 5188, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies, (4 November 2003); doi: 10.1117/12.505684
Show Author Affiliations
Ralph Petersen, Univ. of the Federal Armed Forces (Germany)
Hendrik Rothe, Univ. of the Federal Armed Forces (Germany)

Published in SPIE Proceedings Vol. 5188:
Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies
Angela Duparre; Bhanwar Singh, Editor(s)

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