As AAPSM becomes more widely utilized, the need for defect inspection sensitivity becomes more critical. In addition, accurate defect characterization must be performed to encompass new effects caused by glass defects. Historically, defect size and position have been the two characteristics that were examined when determining inspection tool sensitivity. Because of the nature of AAPSM defects, phase is a factor that must be taken into account. This experiment utilizes two distinct forms of defect characterization -- SEM sizing, and surface profilometry. Programmed defect test masks were manufactured for phase shifting properties at both 248nm and 193nm exposure wavelengths. The defects were also etched at multiple depths resulting in a variety of phase angle errors. Utilizing the two characterization methods mentioned above, the automatic defect inspection tool's sensitivity on multiple programmed defects will be investigated.

Date Published: 28 August 2003
PDF: 8 pages
Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); doi: 10.1117/12.504204

Published in SPIE Proceedings Vol. 5130:
Photomask and Next-Generation Lithography Mask Technology X
Hiroyoshi Tanabe, Editor(s)