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Proceedings Paper

Photomask repeater strategy for high-quality and low-cost reticle fabrication
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Paper Abstract

The severe mask specification makes mask cost increase drastically. Especially, the increase in the mask cost deals ASIC businesses a fatal blow due to its small chip volume per product. Pattern writing cost has always occupied the main part of the prime mask cost and the emphasis of this is still increasing. This paper reports on a Photomask Repeater strategy to be a solution for reducing mask cost in pattern writing, comparing with conventional EB system.

Paper Details

Date Published: 28 August 2003
PDF: 7 pages
Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); doi: 10.1117/12.504178
Show Author Affiliations
Suigen Kyoh, Toshiba Corp. (Japan)
Soichi Inoue, Toshiba Corp. (Japan)
Osamu Ikenaga, Toshiba Corp. (Japan)
Tomotaka Higaki, Toshiba Corp. (Japan)
Fumiaki Shigemitsu, Toshiba Corp. (Japan)
Ichiro Mori, Toshiba Corp. (Japan)
Haruo Kokubo, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)
Nobuyuki Irie, Nikon Corp. (Japan)
Yuki Ishii, Nikon Corp. (Japan)
Toshikazu Umatate, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 5130:
Photomask and Next-Generation Lithography Mask Technology X
Hiroyoshi Tanabe, Editor(s)

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