Proceedings Paper
Actinic aerial image measurement tool for 157-nm lithography| Format | Member Price | Non-Member Price |
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Paper Abstract
Carl Zeiss is currently in the final phase of an AIMS 157 development program in cooperation with Selete, Infineon and International SEMATECH. Based on Carl Zeiss' proven AIMS (Aerial Image Measurement System) technology, the new tool can optically emulate the aerial image generated in any given 157 nm scanner. Beta tools will be shipped throughout 2003. In this work the AIMS fab 157 hardware concept will be described. Latest measurements show that
compared to first measurements CD repeatability and illumination uniformity could be significantly improved.
Paper Details
Date Published: 28 August 2003
PDF: 7 pages
Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003);
Published in SPIE Proceedings Vol. 5130:
Photomask and Next-Generation Lithography Mask Technology X
Hiroyoshi Tanabe, Editor(s)
PDF: 7 pages
Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003);
Show Author Affiliations
Peter Kuschnerus, Carl Zeiss Microelectronic Systems GmbH (Germany)
Thomas Engel, Carl Zeiss Microelectronic Systems GmbH (Germany)
Axel M. Zibold, Carl Zeiss Microelectronic Systems GmbH (Germany)
Claudia Hertfelder, Carl Zeiss Microelectronic Systems GmbH (Germany)
Thomas Engel, Carl Zeiss Microelectronic Systems GmbH (Germany)
Axel M. Zibold, Carl Zeiss Microelectronic Systems GmbH (Germany)
Claudia Hertfelder, Carl Zeiss Microelectronic Systems GmbH (Germany)
Takashi Yasui, Semiconductor Leading Edge Technologies, Inc. (Japan)
Iwao Higashikawa, Semiconductor Leading Edge Technologies, Inc. (Japan)
Christof M. Schilz, Infineon Technologies AG (Germany)
Armin Semmler, Infineon Technologies AG (Germany)
Iwao Higashikawa, Semiconductor Leading Edge Technologies, Inc. (Japan)
Christof M. Schilz, Infineon Technologies AG (Germany)
Armin Semmler, Infineon Technologies AG (Germany)
Published in SPIE Proceedings Vol. 5130:
Photomask and Next-Generation Lithography Mask Technology X
Hiroyoshi Tanabe, Editor(s)
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