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Proceedings Paper

Aerial-image based inspeciton of AAPSM for 193-nm lithography generation
Author(s): Anja Rosenbusch; Shirley Hemar; Reuven Falah
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Paper Abstract

The inspection of alternating phase shifting masks is still one of the major challenges in state-of-the-art mask making. Main issue is that phase defects cannot easily be identified by inspection systems using an inspection wavelength different form the target exposure wavelength. The paper presents inspection results using the Aera193, an aerial image based mask inspection system.

Paper Details

Date Published: 28 August 2003
PDF: 8 pages
Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); doi: 10.1117/12.504060
Show Author Affiliations
Anja Rosenbusch, Etec Systems, Inc., an Applied Materials Co. (United States)
Shirley Hemar, Etec Systems, Inc., an Applied Materials Co. (Israel)
Reuven Falah, Etec Systems, Inc., an Applied Materials Co. (Israel)


Published in SPIE Proceedings Vol. 5130:
Photomask and Next-Generation Lithography Mask Technology X
Hiroyoshi Tanabe, Editor(s)

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