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Proceedings Paper

Planar diffractive optical elements prepared by electron-beam lithography
Author(s): Frantisek Urban; Frantisek Matejka
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Paper Abstract

This paper presents results of research activities devoted to preparing optical diffraction elements for space waves by use of electron-beam lithography. It is shown that the orthogonal electron-beam drawing can increase irregularities and flaws. Relations between the zone area inaccuracy and properties of the relief binary phase transparent screens are described. From these relations, the demands for setting the necessary edge drawing quality of the electron beam exposition are derived.

Paper Details

Date Published: 1 October 1991
PDF: 8 pages
Proc. SPIE 1574, Intl Colloquium on Diffractive Optical Elements, (1 October 1991); doi: 10.1117/12.50102
Show Author Affiliations
Frantisek Urban, Technical Univ. Brno (Czech Republic)
Frantisek Matejka, Institute of Instrument Technology (Czech Republic)

Published in SPIE Proceedings Vol. 1574:
Intl Colloquium on Diffractive Optical Elements
Jerzy Nowak; Marek Zajac, Editor(s)

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