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Proceedings Paper

Ion treatment in technology of diffraction optical elements
Author(s): Natalia P. Shevchenko; K. D. Megorskaja; Irina N. Reshetnikova
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Paper Abstract

Problems of ion treatment in diffraction optical elements (DOE) technology with ion beam and reactive ion beam systems are discussed. Etching is carried out with particular screening of ion beam on contact protecting masks, which are films of organic (light sensitivity composition on the novolac base) and inorganic (vacuum deposited films of Al, ZnS, Nd2O3, As-S) materials. DOE microstructure parameters and optical-technical characteristics of DOE produced on the surface of optical glasses (binary synthesized holograms, phase filters, phase modulating elements of kinoform type with high efficiency) are reported.

Paper Details

Date Published: 1 October 1991
PDF: 6 pages
Proc. SPIE 1574, Intl Colloquium on Diffractive Optical Elements, (1 October 1991); doi: 10.1117/12.50099
Show Author Affiliations
Natalia P. Shevchenko, S. I. Vavilov State Optical Institute (Russia)
K. D. Megorskaja, S. I. Vavilov State Optical Institute (Russia)
Irina N. Reshetnikova, S. I. Vavilov State Optical Institute (Russia)

Published in SPIE Proceedings Vol. 1574:
Intl Colloquium on Diffractive Optical Elements
Jerzy Nowak; Marek Zajac, Editor(s)

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