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Proceedings Paper

Quantum lithography
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Paper Abstract

We show how to beat the `fundamental' noise limits in optical lithography using entangled quantum states. In this talk we will give the theoretical background to optical lithography and its quantum formulation. A proof-in-principle experimental demonstration is described.

Paper Details

Date Published: 16 May 2003
PDF: 5 pages
Proc. SPIE 5111, Fluctuations and Noise in Photonics and Quantum Optics, (16 May 2003); doi: 10.1117/12.497420
Show Author Affiliations
Samuel L. Braunstein, Univ. of Wales (United Kingdom)
Agedi N. Boto, Jet Propulsion Lab. (United States)
Pieter Kok, Jet Propulsion Lab. (United States)
Daniel S. Abrams, Jet Propulsion Lab. (United States)
Colin P. Williams, Jet Propulsion Lab. (United States)
Jonathan P. Dowling, Jet Propulsion Lab. (United States)


Published in SPIE Proceedings Vol. 5111:
Fluctuations and Noise in Photonics and Quantum Optics
Derek Abbott; Jeffrey H. Shapiro; Yoshihisa Yamamoto, Editor(s)

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