We have used the advantages of the photolithographic process to build a Hartmann-Shack type wavefront sensor using a 65 X 50 element binary optic lens array as the wavefront sampling element. The inherent accuracy and versatility of the lithographic process has reduced sampling and calibration errors associated with classic Hartmann sensing by allowing the lens array geometry to be tailored to CCD detector geometry with extreme precision. Combined with a quad-cell centroiding algorithm and wavefront reconstruction routines based on the successive over relaxation (SOR) algorithm, we present a wavefront sensor with submicron spot position accuracy, uniform response curves for all spots in the array, high dynamic range, and relative insensitivity to laboratory environmental vibrations. Experimental results obtained during a comparison of its performance to established wavefront methods are presented.

Date Published: 1 November 1991
PDF: 9 pages
Proc. SPIE 1544, Miniature and Micro-Optics: Fabrication and System Applications, (1 November 1991); doi: 10.1117/12.49374

Published in SPIE Proceedings Vol. 1544:
Miniature and Micro-Optics: Fabrication and System Applications
Chandrasekhar Roychoudhuri; Wilfrid B. Veldkamp, Editor(s)