Proceedings Paper
Fabrication of Step and Flash imprint lithography templates using commercial mask processes| Format | Member Price | Non-Member Price |
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Paper Abstract
This article presents the results of a collaborative effort between Molecular Imprints, Inc. (MII) and Photronics, Inc. to develop a baseline process for fabricating Step and Flash Imprint Lithography (S-FIL) templates that are compatible with lithography tools being developed by MII. S-FIL is a replication technique with sub-50nm resolution capability that has the potential to lead to a low cost, high throughput process. Template fabrication results and S-FIL patterning results on 200mm wafers are presented.
Paper Details
Date Published: 16 June 2003
PDF: 10 pages
Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.490141
Published in SPIE Proceedings Vol. 5037:
Emerging Lithographic Technologies VII
Roxann L. Engelstad, Editor(s)
PDF: 10 pages
Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.490141
Show Author Affiliations
Ecron Thompson, Molecular Imprints, Inc. (United States)
Peter D. Rhyins, Photronics, Inc. (United States)
Ronald D. Voisin, Molecular Imprints, Inc. (United States)
Peter D. Rhyins, Photronics, Inc. (United States)
Ronald D. Voisin, Molecular Imprints, Inc. (United States)
S. V. Sreenivasan, Molecular Imprints, Inc. (United States)
Patrick M. Martin, Photronics, Inc. (United States)
Patrick M. Martin, Photronics, Inc. (United States)
Published in SPIE Proceedings Vol. 5037:
Emerging Lithographic Technologies VII
Roxann L. Engelstad, Editor(s)
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