Proceedings Paper
Characterization of plasma processes with optical emission spectroscopy| Format | Member Price | Non-Member Price |
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Paper Abstract
Real-time multi-channel Optical Emission Spectroscopy was used to record then analyze a color change in an argon plasma. It is shown to be an effective diagnostic tool with value as an on-line monitor where it can be used to call process endpoint while simultaneously testing for undesirable conditions.
Paper Details
Date Published: 1 March 1991
PDF: 8 pages
Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); doi: 10.1117/12.48942
Published in SPIE Proceedings Vol. 1392:
Advanced Techniques for Integrated Circuit Processing
James A. Bondur; Terry R. Turner, Editor(s)
PDF: 8 pages
Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); doi: 10.1117/12.48942
Show Author Affiliations
Douglas S. Malchow, EG&G Princeton Applied Research (United States)
Published in SPIE Proceedings Vol. 1392:
Advanced Techniques for Integrated Circuit Processing
James A. Bondur; Terry R. Turner, Editor(s)
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