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Proceedings Paper

Contact hole inspection by real-time optical CD metrology
Author(s): Jon L. Opsal; Hanyou Chu; Youxian Wen; Guangwei Li; Yia-Chung Chang
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Paper Abstract

We have developed fast numerical solutions to the diffraction of light from a periodic array of contact holes (CH) in microelectronic structures. We present results for contact holes in oxide and in 193 nm and 248 nm photoresists. We also show detectability limits of the CH and observed variations across wafers processed with state-of-the-art lithography.

Paper Details

Date Published: 2 June 2003
PDF: 11 pages
Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); doi: 10.1117/12.487607
Show Author Affiliations
Jon L. Opsal, Therma-Wave, Inc. (United States)
Hanyou Chu, Therma-Wave, Inc. (United States)
Youxian Wen, Therma-Wave, Inc. (United States)
Guangwei Li, Therma-Wave Inc. (United States)
Yia-Chung Chang, Univ. of Illinois/Urbana-Champaign (United States)

Published in SPIE Proceedings Vol. 5038:
Metrology, Inspection, and Process Control for Microlithography XVII
Daniel J. Herr, Editor(s)

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