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Proceedings Paper

Web-based metrology performance diagnostics
Author(s): Ganesh Sundaram; Martin E. Mastovich; Roye Avidor; Jason Remillard; Robert Brandom
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Paper Abstract

Current realities of tighter process tolerances combined with continued reduction in engineering resources per metrology tool require that every step of controlling a process a be made more efficient. Analyzing the quality of metrolgoy results, from equipment such as CD SEMs, can involve many factors that include image quality, measurement outputs, focus setting, and amplitude of system settings that play a role in the metrology results. The most efficient means of accessing large volumes of data today is via the World Wide Web. This paper provides examples of metrology problem resolutions that were achieved through the use of WWW on-line analysis of CD SEM results. The relational database that contains the measurement results, CD SEM settings, and metrology and pattern recognition images can be accessed from any fab PC, and can also be accessed from any fab PC, and can also be accessed from outside the fab by personnel with proper levels of security. Simple navigation through a web browser and the completeness of the data in the results database greatly improve the efficiency of the metrologist and the quality of the diagnosis, for improved process control and personal productivity.

Paper Details

Date Published: 2 June 2003
PDF: 8 pages
Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); doi: 10.1117/12.487603
Show Author Affiliations
Ganesh Sundaram, Schlumberger Ltd. (United States)
Martin E. Mastovich, Schlumberger Ltd. (United States)
Roye Avidor, Schlumberger Ltd. (United States)
Jason Remillard, Schlumberger Ltd. (United States)
Robert Brandom, Schlumberger Ltd. (United States)

Published in SPIE Proceedings Vol. 5038:
Metrology, Inspection, and Process Control for Microlithography XVII
Daniel J. Herr, Editor(s)

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