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Proceedings Paper

Time-resolved monitoring of ZnO plume by ArF laser ablation: influence of surrounding gas
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Paper Abstract

We have investigated dynamics of ablated species in ZnO plume under ArF excimer laser irradiation with emission imaging and spectroscopy, and discussed the effect of a surrounding inert gas. Surrounding He or Ar gas strongly cools down the plume and encourages aggregation of ablated species, which is visualized by second laser irradiation to the plume.

Paper Details

Date Published: 19 February 2003
PDF: 6 pages
Proc. SPIE 4830, Third International Symposium on Laser Precision Microfabrication, (19 February 2003); doi: 10.1117/12.486563
Show Author Affiliations
Yoshizo Kawaguchi, National Institute of Advanced Industrial Science and Technology (Japan)
Aiko Narazaki, National Institute of Advanced Industrial Science and Technology (Japan)
Tadatake Sato, National Institute of Advanced Industrial Science and Technology (Japan)
Hiroyuki Niino, National Institute of Advanced Industrial Science and Technology (Japan)


Published in SPIE Proceedings Vol. 4830:
Third International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Kojiro F. Kobayashi; Koji Sugioka; Reinhart Poprawe; Henry Helvajian, Editor(s)

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