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Proceedings Paper

Overview of optical systems for 30-nm-resolution lithography at EUV wavelengths
Author(s): Russell M. Hudyma
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Paper Abstract

This paper will present and compare several proposed high numerical aperture Extreme Ultraviolet Lithography (EUVL) projection systems designed for 30 nm resolution.

Paper Details

Date Published: 23 December 2002
PDF: 12 pages
Proc. SPIE 4832, International Optical Design Conference 2002, (23 December 2002); doi: 10.1117/12.486427
Show Author Affiliations
Russell M. Hudyma, Paragon Optics, Inc. (United States)

Published in SPIE Proceedings Vol. 4832:
International Optical Design Conference 2002
Paul K. Manhart; Jose M. Sasian, Editor(s)

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