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Proceedings Paper

Challenge for effective OCV control in 90-nm logic gate using ArF lithography
Author(s): Hyun-Jae Kang; Sung-Woo Lee; Doo-Youl Lee; Gi-Sung Yeo; Jung-Hyeon Lee; Han-Ku Cho; Woo-Sung Han; Joo-Tae Moon
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Paper Abstract

The introduction of ArF lithography technology is needed for on-chip linewidth variation(OCV) control less than 10nm in 90nm logic transistor development. Since conventional KrF lithography increased the burdens of mask fabrication and photo process due to excessive optical proximity correction(OPC), ArF lithography is more required to improve pattern feasibility in terms of line edge roughness(LER), corner rounding and contact overlapping margin than before. In this paper, we investigated two major components of OCV, that is, proximity and uniformity using ArF lithography. For a tighter CD control, the proximity can be corrected by hybrid OPC method, which is a combination of rule-based and model-based OPC. The uniformity can be effectively improved by several methods such as lithography-friendly layout formation, optimal substrate condition, decrease in MEEF and tuning of the resist process. In conclusion, by using ArF lithography we could obtain the satisfactory OCV control less than 10nm and reasonable process latitude simultaneously for 90nm logic gate under the condition of well-controlled proximity and uniformity.

Paper Details

Date Published: 26 June 2003
PDF: 8 pages
Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485472
Show Author Affiliations
Hyun-Jae Kang, Samsung Electroincs Co., Ltd. (South Korea)
Sung-Woo Lee, Samsung Electronics Co., Ltd. (South Korea)
Doo-Youl Lee, Samsung Electronics Co., Ltd. (South Korea)
Gi-Sung Yeo, Samsung Electronics Co., Ltd. (South Korea)
Jung-Hyeon Lee, Samsung Electronics Co., Ltd. (South Korea)
Han-Ku Cho, Samsung Electronics Co., Ltd. (South Korea)
Woo-Sung Han, Samsung Electronics Co., Ltd. (South Korea)
Joo-Tae Moon, Samsung Electronics Co., Ltd. (South Korea)

Published in SPIE Proceedings Vol. 5040:
Optical Microlithography XVI
Anthony Yen, Editor(s)

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