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Proceedings Paper

Aberration optimizing system using Zernike sensitivity method
Author(s): Yasuo Shimizu; Tadashi Yamaguchi; Kousuke Suzuki; Yuji Shiba; Tomoyuki Matsuyama; Shigeru Hirukawa
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Paper Abstract

We introduce a projection lens adjustment procedure that is customer application oriented. This technique is based on the simulated imaging performance using Zernike sensitivity, the measurement results of wavefront aberration and wavefront change by lens element position change. This system finds the optimum combination of lens position where the amount of specific imaging performance error is in tolerance. In this paper, the idea of optimization and some optimization results are shown.

Paper Details

Date Published: 26 June 2003
PDF: 10 pages
Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485459
Show Author Affiliations
Yasuo Shimizu, Nikon Corp. (Japan)
Tadashi Yamaguchi, Nikon Systems Inc. (Japan)
Kousuke Suzuki, Nikon Corp. (Japan)
Yuji Shiba, Nikon Corp. (Japan)
Tomoyuki Matsuyama, Nikon Corp. (Japan)
Shigeru Hirukawa, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 5040:
Optical Microlithography XVI
Anthony Yen, Editor(s)

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