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Proceedings Paper

Grating analysis of frequency parsing strategies for imaging interferometric lithography
Author(s): Eric S. Wu; Balu Santhanam; Steven R. J. Brueck
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Paper Abstract

The limitations of a conventional optical lithography are consequences of the limited spatial frequency coverage (~ NA/λ) of the optical system. To improve the resolution of printed patterns, Imaging Interferometric Lithography (IIL) exploits interference phenomena to produce sub-wavelength structures on the wafer and provides a simple approach to attainment of the ultimate spatial frequency coverage of 2/λ, independent of the optical system NA. In the first promising experiments, different divisons of frequency space between multiple exposures were investigated empirically. While the use of multiple exposures includes a better coverage than available from a single exposure, automated software routines or strategies need to be developed to find the optimum setup that makes the best compromise against all of the desirable lithography specifications. From a comprehensive grating analysis, we derive a set of optimal parameters for exposure energy ratio among exposures and search a proper set to improve the aerial image quality. Additionally, comparing with partial coherent imaging schemes, we examine the strengths and weaknesses of IIL through different analyses and these studies provide additional support for IIL as a promising alternative RET for deep sub-wavelength optical lithography.

Paper Details

Date Published: 26 June 2003
PDF: 8 pages
Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485356
Show Author Affiliations
Eric S. Wu, Univ. of New Mexico (United States)
Balu Santhanam, Univ. of New Mexico (United States)
Steven R. J. Brueck, Univ. of New Mexico (United States)

Published in SPIE Proceedings Vol. 5040:
Optical Microlithography XVI
Anthony Yen, Editor(s)

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