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Proceedings Paper

Improved manufacturability by OPC based on defocus data
Author(s): Jorg Thiele; Ines Anke; Henning Haffner; Armin Semmler
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Paper Abstract

The paper describes the advantages of optical proximity correction (OPC) based on defocus data instead of best focus data. By additionally acepting asymmetric variations of the dimension of different patterns e.g. for an isolated line that can become wider than its nominal width this method can deliver structures much more robust against opens and shorts than in the standard OPC approach which is based on data taken at best process conditions. The differences of both OPC methods are compared based on simulations and checked against experimental data of characteristic IC patterns.

Paper Details

Date Published: 10 July 2003
PDF: 9 pages
Proc. SPIE 5042, Design and Process Integration for Microelectronic Manufacturing, (10 July 2003); doi: 10.1117/12.485251
Show Author Affiliations
Jorg Thiele, Infineon Technologies AG (Germany)
Ines Anke, Infineon Technologies AG (Germany)
Henning Haffner, Infineon Technologies AG (Germany)
Armin Semmler, Infineon Technologies AG (Germany)

Published in SPIE Proceedings Vol. 5042:
Design and Process Integration for Microelectronic Manufacturing
Alexander Starikov, Editor(s)

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