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Proceedings Paper

Improved model for focus-exposure data analysis
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Paper Abstract

The paper introduces an improved, physics-based function for fitting lithographic data from focus-exposure matrices. Unlike simple polynomial functions, the coefficients of this equation offer physical insight into the meaning and nature of the data. Derivation of this equation from first principles of the physics of lithographic imaging is presented. Examples based on typical experimental data are shown and the advantages of using a physics-based fitting function is described based on improved fitting and noise filtering.

Paper Details

Date Published: 2 June 2003
PDF: 10 pages
Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); doi: 10.1117/12.485040
Show Author Affiliations
Chris A. Mack, KLA-Tencor Corp. (United States)
Jeff D. Byers, KLA-Tencor Corp. (United States)

Published in SPIE Proceedings Vol. 5038:
Metrology, Inspection, and Process Control for Microlithography XVII
Daniel J. Herr, Editor(s)

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