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Proceedings Paper

Line-edge roughness reduction and CD slimming using hardbake processing
Author(s): Richard D. Peters; Kevin Lucas; Jonathan L. Cobb; Colita Parker; Kyle Patterson; Robb McCauley; Monique Ercken; Frieda Van Roey; Nadia Vandenbroeck; Ivan K.A. Pollentier
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Paper Abstract

Tight control of very small transistor gate CDs is one of the most difficult problems in advanced device patterning. Line-edge roughness on these small gate lines has become a serious issue with 193nm lithography and is only expected to worsen with 157nm and EUV lithography. Methods are needed that can minimize line-edge roughness while also enabling the patterning of small gate features. We have analyzed the use of a simple and manufacturable post-develop bake step, a 'hardbake', that controllably reduces both gate resist CDs and to line-edge roughness. Hardbake resist shrinkage is a well-known phenomena from earlier Novolak resist processing, but has not been investigated for chemically amplified resists as much as other CD slimming techniques. Our tests have been performed for different chemically amplified 193nm and EUV-type (essentially reformulated 248nm) resists. The results of our experiments show considerable potential for certain types of resists to provide gate CD control benefits from either roughness reduction or CD slimming.

Paper Details

Date Published: 2 June 2003
PDF: 12 pages
Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); doi: 10.1117/12.485027
Show Author Affiliations
Richard D. Peters, Motorola, Inc. (United States)
Kevin Lucas, Motorola, Inc. (United States)
Jonathan L. Cobb, Motorola, Inc. (United States)
Colita Parker, Motorola, Inc. (United States)
Kyle Patterson, Motorola, Inc. (France)
Robb McCauley, Motorola, Inc. (United States)
Monique Ercken, IMEC (Belgium)
Frieda Van Roey, IMEC (Belgium)
Nadia Vandenbroeck, IMEC (Belgium)
Ivan K.A. Pollentier, IMEC (Belgium)

Published in SPIE Proceedings Vol. 5038:
Metrology, Inspection, and Process Control for Microlithography XVII
Daniel J. Herr, Editor(s)

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