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Proceedings Paper

Designing a reference for CD-SEM magnification calibration
Author(s): Albert Sicignano; Arkady V. Nikitin; Dmitriy Y. Yeremin; Matthew Sandy; E. Tim Goldburt
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Paper Abstract

In order to design a reference suitable for performing CD-SEM magnification calibration with high precision and accuracy it is necessary to first identify the relevant critical issues. We will discuss why the magnification calibration reference is a key challenge; why CD-SEM magnification calibration is not trivial; and why a suitable magnification calibration reference does not currently exist. We will identify the criticalities for the above issues. We will present a novel solution leading to design criteria for a universal CD-SEM magnification calibration reference.

Paper Details

Date Published: 2 June 2003
PDF: 8 pages
Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); doi: 10.1117/12.485018
Show Author Affiliations
Albert Sicignano, Nanometrology LLC (United States)
Arkady V. Nikitin, Nanometrology LLC (United States)
Dmitriy Y. Yeremin, Nanometrology LLC (United States)
Matthew Sandy, Nanometrology LLC (United States)
E. Tim Goldburt, Nanometrology LLC (United States)

Published in SPIE Proceedings Vol. 5038:
Metrology, Inspection, and Process Control for Microlithography XVII
Daniel J. Herr, Editor(s)

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