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Proceedings Paper

Novel electron optics for large subfield electron-beam projection lithography (EPL)
Author(s): Saori Fukui; Hiroyasu Shimizu; Weiming Ren; Shohei Suzuki; Kazuya Okamoto
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Paper Abstract

In Electron-beam Projection Lithography (EPL), achieving the requirements for the ITRS 45 nm roadmap node will require decreasing simultaneously both the beam blur from the Coulomb interaction effects and the geometrical aberrations from their present values. Because next generation lithography tools are required to have both high resolution and throughput, the Coulomb effect becoems more of an issue. In this paper, we propose a novel concept to effectively decrease the Coulomb effect. Based on this new concept we develop an EPL electron optical system in which not only the Coulomb effect but also the geometrical aberrations are greatly reduced. We report on the properties of this new EPL optical system.

Paper Details

Date Published: 16 June 2003
PDF: 9 pages
Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.484934
Show Author Affiliations
Saori Fukui, Nikon Corp. (Japan)
Hiroyasu Shimizu, Nikon Corp. (Japan)
Weiming Ren, Nikon Corp. (Japan)
Shohei Suzuki, Nikon Corp. (Japan)
Kazuya Okamoto, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 5037:
Emerging Lithographic Technologies VII
Roxann L. Engelstad, Editor(s)

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