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Proceedings Paper

Microscope illumination systems for 157 nm
Author(s): Alexander Pesch; Kristina Uhlendorf; Arnaud Deparnay; Lars Erdmann; Peter Kuschnerus; Thomas Engel; Robert Brunner
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Paper Abstract

The image quality of an inspection microscope depends strongly on the performance of the illumination system. Especially in the case of laser-based illumination it is necessary to transform the original beam profile into a homogeneous light spot with a flat top field distribution. Simultaneously, speckles caused by the coherence of the laser have to be reduced. Here we discuss different ways to homogenize the multi mode beam profile of a pulsed compact 157 nm excimer laser. A variety of setups, combining dynamic acting diffusers, microlens arrays and primary lenses were realized and characterized in several geometrical arrangements. The homogenizers were evaluated and characterized especially with respect to the statistical behavior on the integrated pulse number.

Paper Details

Date Published: 2 June 2003
PDF: 7 pages
Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); doi: 10.1117/12.483464
Show Author Affiliations
Alexander Pesch, Carl Zeiss Jena GmbH (Germany)
Kristina Uhlendorf, Carl Zeiss Jena GmbH (Germany)
Arnaud Deparnay, Carl Zeiss Jena GmbH (Germany)
Lars Erdmann, Carl Zeiss Jena GmbH (Germany)
Peter Kuschnerus, Carl Zeiss Microelectronic Systems GmbH (Germany)
Thomas Engel, Carl Zeiss Microelectronic Systems GmbH (Germany)
Robert Brunner, Carl Zeiss Jena GmbH (Germany)

Published in SPIE Proceedings Vol. 5038:
Metrology, Inspection, and Process Control for Microlithography XVII
Daniel J. Herr, Editor(s)

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