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Proceedings Paper

Laser nanocrystalization of the amorphous silicon with and without metal introduction
Author(s): Li Han; She Qiang Li; Wei Yu; Ying Cai Peng; Guangsheng Fu
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Paper Abstract

Laser nanocrystallization of the amorphous silicon (a-Si) deposited on Si (100) or glass substrate with and without metal catalyst is investigated. SEM results indicate that the surface morphology is presented as many nanograins are studded on the former's surface after crystallization, whereas, only with plenty of spots scattering on the latter's surface. HRTEM studies show that the nanograins are Si nanocrystallites and the spots are actually crystalline Si nanowires. Further analysis on the crystallizing process of the two kinds of annealing has been performed to explain the morphology difference oftwo kinds ofannealing techniques.

Paper Details

Date Published: 12 September 2002
PDF: 4 pages
Proc. SPIE 4915, Lasers in Material Processing and Manufacturing, (12 September 2002); doi: 10.1117/12.482908
Show Author Affiliations
Li Han, Hebei Univ. (China)
She Qiang Li, Hebei Univ. (China)
Wei Yu, Hebei Univ. (China)
Ying Cai Peng, Hebei Univ. (China)
Guangsheng Fu, Hebei Univ. (China)

Published in SPIE Proceedings Vol. 4915:
Lasers in Material Processing and Manufacturing
ShuShen Deng; Tatsuo Okada; Klaus Behler; XingZong Wang, Editor(s)

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