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Proceedings Paper

Laser deposition of amorphous diamond thin films assisted by O plasma
Author(s): Yuhua Li; Wenjie Guan; Weiling Huang
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Paper Abstract

Amorphous diamond thin films have been deposited by pulsed excimer laser (XECL 308nm, 23ns, 300mj) and eched by O plasma. The films were studied with CCD microscopy, SEM, Raman spectroscopy. The films showed an increased surface particle density, a decreased optical transparency, as well as a higher sp3 content. The plasma particle have more higher energy and the duration is very short, so the plasma flux is intensive and this is suitable to deposit amorphous thin films and other metestable material. The role of O plasma have concluded, the characteristic of graphite to diamond have been discussed.

Paper Details

Date Published: 12 September 2002
PDF: 5 pages
Proc. SPIE 4915, Lasers in Material Processing and Manufacturing, (12 September 2002); doi: 10.1117/12.482890
Show Author Affiliations
Yuhua Li, Huazhong Univ. of Science and Technology (China)
Wenjie Guan, Huazhong Univ. of Science and Technology (China)
Weiling Huang, Huazhong Univ. of Science and Technology (China)

Published in SPIE Proceedings Vol. 4915:
Lasers in Material Processing and Manufacturing
ShuShen Deng; Tatsuo Okada; Klaus Behler; XingZong Wang, Editor(s)

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