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Proceedings Paper

Fundamental studies of chemical-vapor-deposition diamond growth processes
Author(s): Robert W. Shaw; William B. Whitten; J. Michael Ramsey; Lee Heatherly
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Paper Abstract

Laser spectroscopic techniques to foster a fundamental understanding of diamond film growth by hot filament chemical vapor deposition (CVD) are being developed. Several spectroscopic techniques are under investigation to identify intermediate species present in the bulk reactor volume, the thin active volume immediately above the growing film, and the actual growing surface. Such a comprehensive examination of the overall deposition process is necessary because a combination of gas phase and surface chemistry is probably operating. Resonantly enhanced multiphoton ionization (REMPI) techniques have been emphasized. A growth reactor that permits through-the-substrate gas sampling for REMPI/time-of-flight mass spectroscopy has been developed.

Paper Details

Date Published: 1 December 1991
PDF: 5 pages
Proc. SPIE 1534, Diamond Optics IV, (1 December 1991); doi: 10.1117/12.48289
Show Author Affiliations
Robert W. Shaw, Oak Ridge National Lab. (United States)
William B. Whitten, Oak Ridge National Lab. (United States)
J. Michael Ramsey, Oak Ridge National Lab. (United States)
Lee Heatherly, Oak Ridge National Lab. (United States)

Published in SPIE Proceedings Vol. 1534:
Diamond Optics IV
Albert Feldman; Sandor Holly, Editor(s)

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