Proceedings Paper
Pattern shape comparison methods using SEM image| Format | Member Price | Non-Member Price |
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Paper Abstract
We have developed a new system, 'PF-3000', which realizes the pattern shape comparison between CAD layout data and CD-SEM images. Comparison results are expressed as the difference of edge location and area in this system. Moreover, we investigated different methods of shape comparison. Fourier descriptor is one of the most useful method.
Paper Details
Date Published: 2 June 2003
PDF: 12 pages
Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); doi: 10.1117/12.482831
Published in SPIE Proceedings Vol. 5038:
Metrology, Inspection, and Process Control for Microlithography XVII
Daniel J. Herr, Editor(s)
PDF: 12 pages
Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); doi: 10.1117/12.482831
Show Author Affiliations
Takahiro Ikeda, Toshiba Corp. (Japan)
Toshiya Kotani, Toshiba Corp. (Japan)
Takashi Sato, Toshiba Corp. (Japan)
Toshiya Kotani, Toshiba Corp. (Japan)
Takashi Sato, Toshiba Corp. (Japan)
Published in SPIE Proceedings Vol. 5038:
Metrology, Inspection, and Process Control for Microlithography XVII
Daniel J. Herr, Editor(s)
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