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Proceedings Paper

Pattern shape comparison methods using SEM image
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Paper Abstract

We have developed a new system, 'PF-3000', which realizes the pattern shape comparison between CAD layout data and CD-SEM images. Comparison results are expressed as the difference of edge location and area in this system. Moreover, we investigated different methods of shape comparison. Fourier descriptor is one of the most useful method.

Paper Details

Date Published: 2 June 2003
PDF: 12 pages
Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); doi: 10.1117/12.482831
Show Author Affiliations
Takahiro Ikeda, Toshiba Corp. (Japan)
Toshiya Kotani, Toshiba Corp. (Japan)
Takashi Sato, Toshiba Corp. (Japan)
Kusuo Ueno, Topcon Corp. (Japan)
Ryoichi Matsuoka, Seiko Instruments Inc. (Japan)

Published in SPIE Proceedings Vol. 5038:
Metrology, Inspection, and Process Control for Microlithography XVII
Daniel J. Herr, Editor(s)

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