Proceedings Paper
Compact laser plasma EUV source based on a gas puff target for metrology| Format | Member Price | Non-Member Price |
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Paper Abstract
In the paper a newly developed compact laser plasma EUV source is presented. The source is based on the double-stream gas puff target approach. The targets are formed by pulsed injection of high-Z gas (xenon) into a hollow stream of low-Z gas (helium) using the valve system composed of two electromagnetic valves and equipped with the double-nozzle setup. The outer stream of gas confines the inner stream improving the gas puff target characteristics (higher density of high-Z gas at longer distance from the nozzle output). It causes efficient absorption of laser energy in a plasma and strong EUV production. The source has been developed in the frame of the EUV sources development project under the MEDEA+ program.
Paper Details
Date Published: 16 June 2003
PDF: 8 pages
Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.482749
Published in SPIE Proceedings Vol. 5037:
Emerging Lithographic Technologies VII
Roxann L. Engelstad, Editor(s)
PDF: 8 pages
Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.482749
Show Author Affiliations
Henryk Fiedorowicz, Military Univ. of Technology (Poland)
Andrzej Bartnik, Military Univ. of Technology (Poland)
Roman Jarocki, Military Univ. of Technology (Poland)
Jerzy Kostecki, Military Univ. of Technology (Poland)
Andrzej Bartnik, Military Univ. of Technology (Poland)
Roman Jarocki, Military Univ. of Technology (Poland)
Jerzy Kostecki, Military Univ. of Technology (Poland)
Janusz Mikolajczyk, Military Univ. of Technology (Poland)
Rafal Rakowski, Military Univ. of Technology (Poland)
Miroslaw Szczurek, Military Univ. of Technology (Poland)
Rafal Rakowski, Military Univ. of Technology (Poland)
Miroslaw Szczurek, Military Univ. of Technology (Poland)
Published in SPIE Proceedings Vol. 5037:
Emerging Lithographic Technologies VII
Roxann L. Engelstad, Editor(s)
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