Share Email Print

Proceedings Paper

Compact laser plasma EUV source based on a gas puff target for metrology
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

In the paper a newly developed compact laser plasma EUV source is presented. The source is based on the double-stream gas puff target approach. The targets are formed by pulsed injection of high-Z gas (xenon) into a hollow stream of low-Z gas (helium) using the valve system composed of two electromagnetic valves and equipped with the double-nozzle setup. The outer stream of gas confines the inner stream improving the gas puff target characteristics (higher density of high-Z gas at longer distance from the nozzle output). It causes efficient absorption of laser energy in a plasma and strong EUV production. The source has been developed in the frame of the EUV sources development project under the MEDEA+ program.

Paper Details

Date Published: 16 June 2003
PDF: 8 pages
Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.482749
Show Author Affiliations
Henryk Fiedorowicz, Military Univ. of Technology (Poland)
Andrzej Bartnik, Military Univ. of Technology (Poland)
Roman Jarocki, Military Univ. of Technology (Poland)
Jerzy Kostecki, Military Univ. of Technology (Poland)
Janusz Mikolajczyk, Military Univ. of Technology (Poland)
Rafal Rakowski, Military Univ. of Technology (Poland)
Miroslaw Szczurek, Military Univ. of Technology (Poland)

Published in SPIE Proceedings Vol. 5037:
Emerging Lithographic Technologies VII
Roxann L. Engelstad, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?