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Proceedings Paper

Portable phase measuring interferometer using Shack-Hartmann method
Author(s): Toru Fujii; Jun Kougo; Yasushi Mizuno; Hiroshi Ooki; Masato Hamatani
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Paper Abstract

A real-time inspection is useful and effective to optimize lens aberrations of excimer-exposure sytem, which can expose patterns less than 100 nm. We have developed a portable i.e., compact and lightweight phase measuring interferometer (P-PMI), which can be attached to a stage of the exposure system during real-time monitoring the aberration of the projection lens mounted on the exposure system. Measured repeatability of the wavefront measurement is ab out 0.1 mλ and tool-to-tool difference is 0.6mλ. Measured wavefront during adjusting a projection lens agree dwell with a simulated result. LWA was successfully optimized using P-PMI data.

Paper Details

Date Published: 2 June 2003
PDF: 7 pages
Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); doi: 10.1117/12.482699
Show Author Affiliations
Toru Fujii, Nikon Corp. (Japan)
Jun Kougo, Nikon Corp. (Japan)
Yasushi Mizuno, Nikon Corp. (Japan)
Hiroshi Ooki, Nikon Corp. (Japan)
Masato Hamatani, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 5038:
Metrology, Inspection, and Process Control for Microlithography XVII
Daniel J. Herr, Editor(s)

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