Share Email Print

Proceedings Paper

Properties of SiO2 buffer layer for silica waveguide by flame hydrolysis deposition
Author(s): Letian Zhang; Yuanda Wu; Wenfa Xie; Hua Xing; Aiwu Li; Wei Zheng; Yushu Zhang
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Si02 films were fabricated on Si substrates by flame hydrolysis deposition (FHD) as buffer layer of waveguides. The optical and surface properties of the films were characterized using scanning electron microanalyzer (SEM), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM) and variable angle spectroscopic ellipsometry (VASE). From a series of analyses, we demonstrated the excellent silica films fabricated. It proves that Si02 films prepared by flame hydrolysis deposition are entirely able to be applied in planar optical waveguides.

Paper Details

Date Published: 29 August 2002
PDF: 5 pages
Proc. SPIE 4905, Materials and Devices for Optical and Wireless Communications, (29 August 2002);
Show Author Affiliations
Letian Zhang, Jilin Univ. (China)
Yuanda Wu, Jilin Univ. (China)
Wenfa Xie, Jilin Univ. (China)
Hua Xing, Jilin Univ. (China)
Aiwu Li, Jilin Univ. (China)
Wei Zheng, Jilin Univ. (China)
Yushu Zhang, Jilin Univ. (China)

Published in SPIE Proceedings Vol. 4905:
Materials and Devices for Optical and Wireless Communications
Constance J. Chang-Hasnain; YuXing Xia; Kenichi Iga, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?