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Proceedings Paper

Single step direct-write photomask made from bimetallic Bi/In thermal resist
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Paper Abstract

A new single step direct-write photomask process has been proposed by using Bi/In bimetallic thermal resist which turns almost transparent with high energy laser exposure. The Bi over In metallic films, each layer approximately 40 nm thick, were DC-sputtered onto quartz mask plate substrates in a single pump-down chamber. Before laser exposure the Bi/In had 2.91 Optical Density. Bi/In is a bimetallic thermal resist and hence shows near wavelength invariance exposure sensitivity from Near IR to UV light. For Bi/In exposure, up to 0.9 W Argon laser (514 nm) beam was focused by an f = 50 mm lens to a 10 micron spot. When writing a mask the Bi/In coated sample was placed on a computer-controlled high accuracy X-Y table and the pattern was raster-scanned by the laser at 10 mm/sec. After exposure the Bi/In film became nearly transparent (0.26 OD) at I-line (365 nm) wavelength, and remained conductive. Bi/In photomasks have been used together with a standard mask aligner to pattern the oxide and Al layer during the manufacturing of test solar cell devices in the lab. Experiments also showed that annealing the as-deposited films at 90°C before laser exposure increase the Bi/In transparency.

Paper Details

Date Published: 17 October 2003
PDF: 12 pages
Proc. SPIE 4977, Photon Processing in Microelectronics and Photonics II, (17 October 2003); doi: 10.1117/12.479415
Show Author Affiliations
Glenn H. Chapman, Simon Fraser Univ. (Canada)
Richard Yuqiang Tu, Simon Fraser Univ. (Canada)

Published in SPIE Proceedings Vol. 4977:
Photon Processing in Microelectronics and Photonics II
Alberto Piqué; David B. Geohegan; Friedrich G. Bachmann; Koji Sugioka; Frank Träger; Jan J. Dubowski; Peter R. Herman; Willem Hoving; Kouichi Murakami; Kunihiko Washio; Jim Fieret, Editor(s)

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