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Proceedings Paper

Noncontact fluorence measurements for inspection and imprint depth control in nanoimprint lithography
Author(s): Ch. Finder; C Mayer; Hubert Schulz; Hella-Christin Scheer; Marion Fink; Karl Pfeiffer
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Paper Abstract

Fluorescence microscopy was introduced as a low cost contamination-free method for rapid quality assessment of an imprint process. An optical microscope equipped with a UV- light source was used and the polymer for imprint was labeled with a fluorescent dye, based on perylene- tetracarboxylic acid dianhydride. The fluorescence images were compared with SEM measurements as well as profilometer data. Fluorescence microscopy was successfully applied to detect sticking of the polymer, typical flow defects like filling deficiencies and uniformity of the imprint depth.

Paper Details

Date Published: 16 August 2002
PDF: 6 pages
Proc. SPIE 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (16 August 2002); doi: 10.1117/12.479357
Show Author Affiliations
Ch. Finder, University of Duisburg (Germany)
C Mayer, University of Duisburg (Germany)
Hubert Schulz, Univ. of Wuppertal (Germany)
Hella-Christin Scheer, Univ. of Wuppertal (Germany)
Marion Fink, microresist technology (Germany)
Karl Pfeiffer, microresist technology (Germany)

Published in SPIE Proceedings Vol. 4764:
18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

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