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Proceedings Paper

Actual performance data obtained on new transmitted light mask metrology system
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Paper Abstract

To keep pace with continuously shrinking design rules for masks and reticles Leica Microsystems has developed the new mask metrology tool LMS IPRO2. It is designed to measure pattern placement and CDs in transmitted light at i-line (365nm) illumination. Details on improvements over the previous system and performance data from the beta-site system are presented. The step to a shorter illumination wavelength leads to a better optical resolution power resulting in an improved edge detection. Transmitted light illumination enables to use the tool for CD measurement on quartz and phase shift masks.

Paper Details

Date Published: 16 August 2002
PDF: 7 pages
Proc. SPIE 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (16 August 2002); doi: 10.1117/12.479348
Show Author Affiliations
Klaus-Dieter Roeth, Leica Microsystems Semiconductor GmbH (Germany)
Gerhard W.B. Schlueter, Leica Microsystems Semiconductor GmbH (Germany)

Published in SPIE Proceedings Vol. 4764:
18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

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